Large area silicon epitaxy using pulsed DC magnetron sputtering deposition
نویسندگان
چکیده
منابع مشابه
CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...
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ژورنال
عنوان ژورنال: Microelectronic Engineering
سال: 2008
ISSN: 0167-9317
DOI: 10.1016/j.mee.2007.11.007